Silicon-germanium (SiGe) nanostructures [electronic resource] : production, properties and applications in electronics / edited by Yasuhiro Shiraki and Noritaka Usami.
- 其他作者:
- 其他題名:
- Woodhead Publishing in materials.
- Woodhead Publishing in materials
- 出版: Cambridge, UK : Philadelphia, PA :Woodhead Publishing 2011.
- 叢書名: Woodhead Publishing in materials
- 主題: Nanostructured materials. , Silicon alloys. , Germanium alloys. , Electronic circuits. , Nanoelectronics.
- ISBN: 9781845696894 (electronic bk.) 、 1845696891 (electronic bk.)
- URL:
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- 書目註:Includes bibliographical references and index.
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讀者標籤:
- 系統號: 005235968 | 機讀編目格式
館藏資訊
Nanostructured silicon-germanium (SiGe) opens up the prospects of novel and enhanced electronic device performance, especially for semiconductor devices. Silicon-germanium (SiGe) nanostructures reviews the materials science of nanostructures and their properties and applications in different electronic devices. The introductory part one covers the structural properties of SiGe nanostructures, with a further chapter discussing electronic band structures of SiGe alloys. Part two concentrates on the formation of SiGe nanostructures, with chapters on different methods of crystal growth such as molecular beam epitaxy and chemical vapour deposition. This part also includes chapters covering strain engineering and modelling. Part three covers the material properties of SiGe nanostructures, including chapters on such topics as strain-induced defects, transport properties and microcavities and quantum cascade laser structures. In Part four, devices utilising SiGe alloys are discussed. Chapters cover ultra large scale integrated applications, MOSFETs and the use of SiGe in different types of transistors and optical devices. With its distinguished editors and team of international contributors, Silicon-germanium (SiGe) nanostructures is a standard reference for researchers focusing on semiconductor devices and materials in industry and academia, particularly those interested in nanostructures.